Semantic Scholar Open Access 2005 496 sitasi

Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment.

M. Borselli T. Johnson O. Painter

Lihat Sumber DOI

Abstrak

Using a combination of resist reflow to form a highly circular etch mask pattern and a low-damage plasma dry etch, high-quality-factor silicon optical microdisk resonators are fabricated out of silicon-on-insulator (SOI) wafers. Quality factors as high as Q = 5x10(6) are measured in these microresonators, corresponding to a propagation loss coefficient as small as alpha ~ 0.1 dB/cm. The different optical loss mechanisms are identified through a study of the total optical loss, mode coupling, and thermally-induced optical bistability as a function of microdisk radius (5-30 microm). These measurements indicate that optical loss in these high-Q microresonators is limited not by surface roughness, but rather by surface state absorption and bulk free-carrier absorption.

Topik & Kata Kunci

Materials Science Medicine

Penulis (3)

M. Borselli

T. Johnson

O. Painter

Format Sitasi

APA MLA BibTeX

Borselli, M., Johnson, T., Painter, O. (2005). Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment.. https://doi.org/10.1364/OPEX.13.001515

Akses Cepat

Lihat di Sumber doi.org/10.1364/OPEX.13.001515

Informasi Jurnal

Tahun Terbit: 2005
Bahasa: en
Total Sitasi: 496×
Sumber Database: Semantic Scholar
DOI: 10.1364/OPEX.13.001515
Akses: Open Access ✓