Second harmonic microscopy of monolayer MoS 2
Abstrak
We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. Second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 1E-7 m/V. The susceptibility reduces by a factor of seven in trilayers, and by about two orders of magnitude in even layers. A proof-of-principle second harmonic microscopy measurement is performed on samples grown by chemical vapor deposition, which illustrates potential applications of this effect in fast and non-invasive detection of crystalline orientation, thickness uniformity, layer stacking, and single-crystal domain size of atomically thin films of MoS2 and similar materials.
Topik & Kata Kunci
Penulis (7)
Nardeep Kumar
S. Najmaei
Q. Cui
F. Ceballos
P. Ajayan
J. Lou
Hui Zhao
Akses Cepat
- Tahun Terbit
- 2013
- Bahasa
- en
- Total Sitasi
- 516×
- Sumber Database
- Semantic Scholar
- DOI
- 10.1103/PhysRevB.87.161403
- Akses
- Open Access ✓