DOAJ Open Access 2020

Electrodeposition of Copper Metal from the 1-Ethyl-3-methylimidazolium Fluoride ([EMIM]F)-urea-H2O System Containing Cu2O

Wencai HE Zhongning SHI Fengguo LIU Shan YANG

Lihat Sumber DOI

Abstrak

In this work, [EMIM]F-urea-H2O system is capable of dissolving Cu2O, and then the metallic copper was electrodeposited from this system at room temperature. The reduction of Cu (I) in this system involves a quasi-reversible and one-step single-electron transfer process. The electrodeposition of copper was performed on a tungsten (W) substrate at −0.67 V (vs. Ag) and 353 K via potentiostatic electrolysis. The electrodeposits were identified as metallic copper, as verified by XRD and EDS. SEM image shows that uniform, polygonal nanoparticles of copper were obtained after the potentiostatic static electrolysis.

Topik & Kata Kunci

Technology Physical and theoretical chemistry

Penulis (4)

Wencai HE

Zhongning SHI

Fengguo LIU

Shan YANG

Format Sitasi

APA MLA BibTeX

HE, W., SHI, Z., LIU, F., YANG, S. (2020). Electrodeposition of Copper Metal from the 1-Ethyl-3-methylimidazolium Fluoride ([EMIM]F)-urea-H2O System Containing Cu2O. https://doi.org/10.5796/electrochemistry.20-00031

Akses Cepat

Lihat di Sumber doi.org/10.5796/electrochemistry.20-00031

Informasi Jurnal

Tahun Terbit: 2020
Sumber Database: DOAJ
DOI: 10.5796/electrochemistry.20-00031
Akses: Open Access ✓