DOAJ Open Access 2025

Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma

Espedito Vassallo Miriam Saleh Matteo Pedroni Anna Cremona Dario Ripamonti

Abstrak

A capacitively coupled radio-frequency argon plasma, used for tungsten sputtering deposition, is characterized using Langmuir probe measurements. Druyvesteyn’s method is used to evaluate plasma parameters through the integral of the Electron Energy Distribution Function (EEDF). In the pressure range analyzed (0.6–10 Pa), the obtained distributions are not Maxwellian, which suggests some depletion of electrons with higher energies. The obtained plasma parameters are compared with those derived from the graphical method. The electron temperature obtained via the graphical method is always lower than the effective temperatures derived from EEDFs, and vice versa, the electron density is overestimated by the graphical method. Optical Emission Spectroscopy is used to monitor the atoms sputtered in the plasma process. The behavior of excited species correlates with the plasma parameters.

Topik & Kata Kunci

Physics Plasma physics. Ionized gases

Penulis (5)

Espedito Vassallo

Miriam Saleh

Matteo Pedroni

Anna Cremona

Dario Ripamonti

Format Sitasi

APA MLA BibTeX

Vassallo, E., Saleh, M., Pedroni, M., Cremona, A., Ripamonti, D. (2025). Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma. https://doi.org/10.3390/plasma8010008

Akses Cepat

PDF tidak tersedia langsung

Cek di sumber asli →

Lihat di Sumber doi.org/10.3390/plasma8010008

Informasi Jurnal

Tahun Terbit: 2025
Sumber Database: DOAJ
DOI: 10.3390/plasma8010008
Akses: Open Access ✓