High-Aspect-Ratio Shape Replica Mold Fabrication Using Nanoimprinting and Silver Ink as Etching Mask

Effective high-aspect-ratio molds that minimize vacuum processes are becoming increasingly important for producing metalenses and other devices. To fabricate a high-aspect-ratio structure, a metal film must be used as a mask for dry etching, typically achieved via vacuum deposition. To avoid this vacuum process, we devised a method to develop an etching mask in the air using silver ink. The manufacturing method involved filling the mold with silver ink, baking it, removing silver from the convex parts of the mold with a polyethylene terephthalate film, and placing silver from the concave parts of the mold on top of the ultraviolet (UV)-cured resin using ultraviolet-nanoimprint lithography. The transferred pattern had silver on the convex parts, which was used as a mask for the oxygen dry etching of the UV-curable resin. Consequently, high-aspect-ratio resin shapes were obtained from three types of nano- and micromolds. Additionally, a high-aspect-ratio resin with silver was used as a replica mold to form a silver pattern. This process is effective and allows high-aspect-ratio patterns to be obtained from master molds.