Study on Microstructure and Corrosion Resistance of TiAlN Films Deposited by Multi - Arc Ion Plating under Different Negative Bias Voltages

At present,there are few studies focusing on the effect of negative bias voltage on the corrosion resistance of TiAlN films deposited by arc ion plating.In this paper,TiAlN films were deposited on M2 high speed steel by arc ion plating,and scanning electron microscope (SEM),X-ray diffraction (XRD),electrochemical test and other methods were used to study the influences of negative bias voltage on substrate on the microstructure,surface morphology and corrosion resistance of the as-prepared films.Results showed that the negative bias voltage was an important process parameter affecting the surface morphology of TiAlN films deposited by arc ion plating.A proper negative bias voltage could effectively improve the morphology and compactness of the surface film and reduce the size and number of large molten droplets on the surface.The main phase of TiAlN films was AlTi3N(111),and the films mainly grew along the (111) direction.When the negative bias voltage was increased,a new reaction would occur and a Ti2AlN (100) diffraction peak would appear.With the increase of the negative bias voltage on substrate,the microhardness of the films increased first and then decreased.When the negative bias voltage was 150 V,the microhardness reached the maximum value of 2 725 HV,the relative corrosion rate was the lowest,and the corrosion resistance was the best.