A bibliometric analysis of global research on orchard fertigation

【Objective】Fertigation is a key technique for ensuring sustained yield and resource use efficiency of orchards and has become a global research focus. This paper provides a systematic overview on the current status, research hotspots and emerging trends in orchard fertigation.【Method】Literature from the China National Knowledge Infrastructure (CNKI) and Web of Science (WOS) databases was analyzed using VOSviewer and CiteSpace for visualization. The analysis focused on the number of publications, lead institutions, contributing countries, and frequently used keywords in orchard fertigation.【Result】The number of publications in both Chinese and English journals has shown a steady increase, with horticultural journals publishing the most articles. However, the number of publications and the level of collaboration among Chinese institutions and authors remain relatively low. Among the top ten most productive institutions in English journals, two are from China and four from the United States. The United States leads in terms of number of publication, total citations, and H-index. Regarding international collaboration, the United States is at the top of the ranking, followed by China. Research areas in papers published in Chinese journals have evolved from evaluating technical applications to innovating technologies aimed at achieving precision irrigation and fertilization, with water-saving and digitalization emerging as top research areas. In contrast, research areas in English journals have shifted from soil fertility to water use efficiency, and current hotspots include gas exchange and nitrogen absorption and distribution. Additionally, there is growing emphasis on protecting ecological functions and minimizing environmental impact in the use of fertigation.【Conclusion】Orchard fertigation remains a prominent research hotspot. Future advancements in fertigation technology are expected to move toward more scientific, intelligent, automated, and precision control.