DOAJ Open Access 2024

Leakage current in GaN-on-GaN vertical GaN SBDs grown by HVPE on native GaN substrates

Weiyi Jin Yumin Zhang Songyuan Xia Qizhi Zhu Yuanhang Sun +3 lainnya

Abstrak

This study investigates leakage mechanisms in vertical GaN-on-GaN Schottky barrier diodes (SBDs) and demonstrates effective mitigation strategies. The fabricated devices exhibit low reverse leakage current (1 × 10−5 A/cm2 at −200 V) and a high Ion/Ioff ratio (∼1010), surpassing the performance of GaN SBDs on foreign substrates. We elucidate dominant leakage mechanisms—thermionic emission, Poole–Frenkel emission, and variable-range hopping—and their evolution with temperature and bias. Optimized fabrication processes, including defect etching and a novel dual-layer passivation technique, achieve over a 1000-fold reduction in leakage current.

Topik & Kata Kunci

Penulis (8)

W

Weiyi Jin

Y

Yumin Zhang

S

Songyuan Xia

Q

Qizhi Zhu

Y

Yuanhang Sun

J

Juemin Yi

J

Jianfeng Wang

K

Ke Xu

Format Sitasi

Jin, W., Zhang, Y., Xia, S., Zhu, Q., Sun, Y., Yi, J. et al. (2024). Leakage current in GaN-on-GaN vertical GaN SBDs grown by HVPE on native GaN substrates. https://doi.org/10.1063/5.0208706

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Informasi Jurnal
Tahun Terbit
2024
Sumber Database
DOAJ
DOI
10.1063/5.0208706
Akses
Open Access ✓