DOAJ Open Access 2025

Introducing deep trap states for high dielectric strength of aramid‐based composite films

Wenqi Zhang Qibin Wang Guangyi Shen Sidi Fan Xiaozhou Fan +4 lainnya

Abstrak

Abstract Aramid nanofiber (ANF)‐based composites have drawn tremendous interest in high‐voltage electrical systems due to their superior insulation strength, thermal stability, and mechanical endurance. However, the filler agglomeration and interface compatibility have retarded further improvement of the dielectric performance. Herein, the nano‐titanium dioxide (TiO2) particles treated by aminopropyl triethoxysilane (APTES) serve as the inorganic fillers, which are doped in the ANF to prepare the composite nano‐paper via the blade coating method. The electrostatic interaction between the ANF and fillers highly promotes their uniform distribution. Compared to the pure ANF paper, the composite paper has a denser structure with reduced pores and defects, which significantly improves its dielectric performance with inhibited partial discharge development. At a filler loading of 3 wt% (mass fraction), the breakdown strength is increased by 70.5% to a maximum value of 358.1 kV/mm, while the bulk conductivity is minimised to 5.2 × 10−17 S/m, representing an 88.1% decrease. By analysing the energy band structure of each component, energy barriers at the interface for electrons (1.48 eV) and holes (0.40 eV) are determined. These values indicate deepened trap energy levels, which greatly strengthen the carrier trapping effect for improved dielectric performance.

Penulis (9)

W

Wenqi Zhang

Q

Qibin Wang

G

Guangyi Shen

S

Sidi Fan

X

Xiaozhou Fan

R

Rui Yang

Y

Yunpeng Liu

X

Xiang Yu

F

Fangcheng Lv

Format Sitasi

Zhang, W., Wang, Q., Shen, G., Fan, S., Fan, X., Yang, R. et al. (2025). Introducing deep trap states for high dielectric strength of aramid‐based composite films. https://doi.org/10.1049/hve2.12483

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Informasi Jurnal
Tahun Terbit
2025
Sumber Database
DOAJ
DOI
10.1049/hve2.12483
Akses
Open Access ✓