DOAJ Open Access 2026

Enhancing tomato tolerance to low phosphorus stress through exogenous nano-silicon application

Haoting Chen Mengzhu Xu Ting Tao Yongjun Zhu Binchuan Chang +3 lainnya

Abstrak

Phosphorus is essential for plant growth, but excessive fertilizer may deplete phosphate rock reserves and cause environmental issues like eutrophication. Silicon has been reported to improve phosphorus use efficiency, yet the physiological and morphological responses of plants to low-phosphorus (LP) stress across developmental stages remain insufficiently characterized. In this study, we investigated the impact of ionic and nano-silicon foliar sprays (20 and 100 mg·L⁻¹) on the LP stress responses of hydroponically grown tomato seedlings. LP stress hindered seedling growth, elevated lipid peroxidation, and impaired carbohydrate metabolism, leading to altered fruit morphology and quality. Among all treatments, 100 mg·L⁻¹ nano-silicon most effectively reduced ROS accumulation through enhanced antioxidant enzyme activities. It also optimized carbohydrate metabolism by upregulating sucrose synthase and invertase activities, thereby promoting organic matter accumulation and allocation. These improvements increased tomato yield by ∼19 % under LP stress. Fruit quality was also enhanced, with soluble sugar, sucrose, and vitamin C contents increasing by ∼50 %, ∼70 %, and ∼47 %, respectively. Overall, these findings demonstrate that exogenous foliar application of nano-silicon represents a promising agronomic strategy for improving the tolerance of tomato seedlings and fruit quality under LP conditions.

Topik & Kata Kunci

Penulis (8)

H

Haoting Chen

M

Mengzhu Xu

T

Ting Tao

Y

Yongjun Zhu

B

Binchuan Chang

Y

Yu Shi

J

Jin Xu

Y

Yi Zhang

Format Sitasi

Chen, H., Xu, M., Tao, T., Zhu, Y., Chang, B., Shi, Y. et al. (2026). Enhancing tomato tolerance to low phosphorus stress through exogenous nano-silicon application. https://doi.org/10.1016/j.scienta.2026.114635

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Informasi Jurnal
Tahun Terbit
2026
Sumber Database
DOAJ
DOI
10.1016/j.scienta.2026.114635
Akses
Open Access ✓