DOAJ Open Access 2024

n‐Type GaSe Thin Flake for Field Effect Transistor, Photodetector, and Optoelectronic Memory

Arun Kumar Aniello Pelella Kimberly Intonti Loredana Viscardi Ofelia Durante +8 lainnya

Abstrak

Abstract The family of 2D chalcogenide semiconductors has been growing rapidly. Metal monochalcogenides, for instance, can enable new possibilities in functional electronics and optoelectronics. A Gallium Selenide (GaSe) thin flake is used to fabricate a back gated field effect transistor (FET) with n‐type conduction behavior and wide hysteresis at the ambient conditions. The device shows high mobility up to 28 cm2 V−1 s−1 with Ion/Ioff ratio over 103. Under the laser exposure, the device shows a decrease in the threshold voltage and a left‐shift of the transfer characteristic with a slight increase in the current. The transfer characteristic exhibits a hysteretic behavior with hysteresis width linearly dependent on the applied gate voltage. Moreover, the GaSe‐based FET shows a photo response with a photoresponsivity of 475 mAW−1 and detectivity of 4.6 × 1012 Jones. The photocurrent rise and decay times are 0.1 and 1.3 s, respectively. Furthermore, the GaSe FET device can be used as a performant memory device with well separated states and memory window enhanced by the laser exposure, confirming an optoelectronic memory class.

Penulis (13)

A

Arun Kumar

A

Aniello Pelella

K

Kimberly Intonti

L

Loredana Viscardi

O

Ofelia Durante

F

Filippo Giubileo

P

Paola Romano

H

Hazel Neill

V

Vilas Patil

L

Lida Ansari

P

Paul K. Hurley

F

Farzan Gity

A

Antonio Di Bartolomeo

Format Sitasi

Kumar, A., Pelella, A., Intonti, K., Viscardi, L., Durante, O., Giubileo, F. et al. (2024). n‐Type GaSe Thin Flake for Field Effect Transistor, Photodetector, and Optoelectronic Memory. https://doi.org/10.1002/aelm.202400010

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Informasi Jurnal
Tahun Terbit
2024
Sumber Database
DOAJ
DOI
10.1002/aelm.202400010
Akses
Open Access ✓