CrossRef Open Access 2013

Measurement technique of telecentricity for the illumination system in the 193nm photolithography

Shunping Shi Yiping Cao Zhenfen Huang Yang Li

Penulis (4)

S

Shunping Shi

Y

Yiping Cao

Z

Zhenfen Huang

Y

Yang Li

Format Sitasi

Shi, S., Cao, Y., Huang, Z., Li, Y. (2013). Measurement technique of telecentricity for the illumination system in the 193nm photolithography. https://doi.org/10.1016/j.ijleo.2012.09.027

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Informasi Jurnal
Tahun Terbit
2013
Bahasa
en
Sumber Database
CrossRef
DOI
10.1016/j.ijleo.2012.09.027
Akses
Open Access ✓