arXiv Open Access 2025

Regional chemical potential analysis for material surfaces

Masahiro Fukuda Masato Senami Yoshiaki Sugimoto Taisuke Ozaki
Lihat Sumber

Abstrak

We propose a local regional chemical potential (RCP) analysis method based on an energy window scheme to quantitatively estimate the selectivity of atomic and molecular adsorption on surfaces, as well as the strength of chemical bonding forces between a probe tip and a surface in atomic force microscopy (AFM) measurements. In particular, focusing on the local picture of covalent bonding, we use a simple H$_2$ molecular model to demonstrate a clear relationship between chemical bonding forces and the local RCP. Moreover, density functional theory calculations on molecular systems and diamond C(001) surfaces reveal that the local RCP at the surfaces successfully visualizes electron-donating regions such as dangling bonds and double bonds. These results suggest that the local RCP can serve as an effective measure to analyze high-resolution non-contact or near-contact AFM images enhanced by chemical bonding forces.

Penulis (4)

M

Masahiro Fukuda

M

Masato Senami

Y

Yoshiaki Sugimoto

T

Taisuke Ozaki

Format Sitasi

Fukuda, M., Senami, M., Sugimoto, Y., Ozaki, T. (2025). Regional chemical potential analysis for material surfaces. https://arxiv.org/abs/2505.04053

Akses Cepat

Lihat di Sumber
Informasi Jurnal
Tahun Terbit
2025
Bahasa
en
Sumber Database
arXiv
Akses
Open Access ✓