arXiv Open Access 2023

Reliable micro-transfer printing method for heterogeneous integration of lithium niobate and semiconductor thin films

Tom Vandekerckhove Tom Vanackere Jasper De Witte Stijn Cuyvers Luis Reis +4 lainnya

Lihat Sumber

Abstrak

High-speed Pockels modulation and second-order nonlinearities are key components in optical systems, but CMOS-compatible platforms like silicon and silicon nitride lack these capabilities. Micro-transfer printing of thin-film lithium niobate offers a solution, but suspending large areas of thin films for long interaction lengths and high-Q resonators is challenging, resulting in a low transfer yield. We present a new source preparation method that enables reliable transfer printing of thin-film lithium niobate. We demonstrate its versatility by successfully applying it to gallium phosphide and silicon, and provide an estimate of the transfer yield by subsequently printing 25 lithium niobate films without fail.

Topik & Kata Kunci

physics.optics physics.app-ph

Penulis (9)

Tom Vandekerckhove

Tom Vanackere

Jasper De Witte

Stijn Cuyvers

Luis Reis

Maximilien Billet

Günther Roelkens

Stéphane Clemmen

Bart Kuyken

Format Sitasi

APA MLA BibTeX

Vandekerckhove, T., Vanackere, T., Witte, J.D., Cuyvers, S., Reis, L., Billet, M. et al. (2023). Reliable micro-transfer printing method for heterogeneous integration of lithium niobate and semiconductor thin films. https://arxiv.org/abs/2304.13760

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Informasi Jurnal

Tahun Terbit: 2023
Bahasa: en
Sumber Database: arXiv
Akses: Open Access ✓